Nanoco Technologies, Ltd applies for US Patent titled as 'H2S Reactive Anneal to Reduce Carbon in Nanoparticle-Derived Thin Films'

 
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ALEXANDRIA, Va: United States Patent and Trademark Office has received an application no. 20150221795 for US Patent, published on August 06, 2015, by Nanoco Technologies, Ltd, titled as "H2S Reactive Anneal to Reduce Carbon in Nanoparticle-Derived Thin Films" for the registration of patent.

Inventors:

Kirkham; Paul; (Lancashire, GB) ; Allen; Cary; (Manchester, GB) ; Whitelegg; Stephen; (Stockport, GB)

Applicant:

Nanoco Technologies, Ltd.

Manchester

GB

According to the abstract released by the U.S. Patent & Trademark Office: "A method for preparing CIGS absorber layers using CIGS nanoparticles on a substrate comprises one or more annealing steps that involve heating the CIGS nanoparticle film(s) to dry the film and possibly to fuse the CIGS nanoparticles together to form CIGS crystals. Generally, at least the final annealing step will induce particle fusion to form CIGS crystals. Reactive gas annealing has been found to facilitate the growth of larger...

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